Features
● WR-28 Rectangular Waveguide Interface
● Dual Polarization
● High Port Isolation
● Precisely Machined
Specifications
|
Item |
Specification |
Units |
||
|
Frequency Range |
26.5-40 |
GHz |
||
|
Gain |
20 Typ. |
dBi |
||
|
VSWR |
1.5:1 Typ. |
|
||
|
Polarization |
Dual |
|
||
|
Port Isolation |
50 Typ. |
dB |
||
|
Cross Polarization |
40 Typ. |
dB |
||
|
3db Beamwidth, E-Plane |
11.40~15.65 |
° |
||
|
3db Beamwidth, H-Plane |
13.0~18.80 |
° |
||
|
Interface |
FBP320(A Type) |
2.4-Female(C Type) |
|
|
|
Finishing |
Black Plated |
|
||
|
Material |
Al |
|
||
|
Size (L*W*H), C Type |
162.1*48.5*63.1(±5) |
mm |
||
|
Weight |
0.387(A Type) |
0.405(C Type) |
Kg |
|
|
Power Handling, C Type |
CW: 10 |
Peak: 20 |
W |
|
The Conical Dual Polarized Horn Antenna represents a sophisticated evolution in microwave antenna design, combining the superior pattern symmetry of conical geometry with dual-polarization capability. This antenna features a smoothly tapered conical flare structure that accommodates two orthogonal polarization channels, typically integrated through an advanced Orthogonal Mode Transducer (OMT).
Key Technical Advantages:
-
Exceptional Pattern Symmetry: Maintains symmetrical radiation patterns in both E and H planes
-
Stable Phase Center: Provides consistent phase characteristics across operating bandwidth
-
High Port Isolation: Typically exceeds 30 dB between polarization channels
-
Wideband Performance: Generally achieves 2:1 or greater frequency ratio (e.g., 1-18 GHz)
-
Low Cross-Polarization: Typically better than -25 dB
Primary Applications:
-
Precision antenna measurement and calibration systems
-
Radar cross-section measurement facilities
-
EMC/EMI testing requiring polarization diversity
-
Satellite communication ground stations
-
Scientific research and metrology applications
The conical geometry significantly reduces edge diffraction effects compared to pyramidal designs, resulting in cleaner radiation patterns and more accurate measurement capabilities. This makes it particularly valuable in applications demanding high pattern purity and measurement precision.
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